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Screenshot of High-Purity Hydrogen Silsesquioxane EBL Resist

High-Purity Hydrogen Silsesquioxane EBL Resist

DisChem, Inc. provides high-purity hydrogen silsesquioxane EBL resist for nanotechnology research. This H-SiQ formulation offers high resolution and etch resistance for sub-10nm patterning, remaining stable and consistent for precise feature control in micro-fabrication projects.

https://discheminc.com/resist-materials/
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    Submitted this listing · 4 months ago

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